Analytical Instrumentation, Methods & Materials
Systems And Methods For Undermedia Repellency
WARF: P170307US02
Inventors: David Beebe, Chao Li, Jiaquan Yu, Theodorus de Groot
The Invention
Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.
Additional Information
For More Information About the Inventors
For current licensing status, please contact Jeanine Burmania at [javascript protected email address] or 608-960-9846