Semiconductors & Integrated Circuits
Arrays Of High-Aspect-Ratio Germanium Nanostructures With Nanoscale Pitch And Methods For The Fabrication Thereof
WARF: P200069US01
Inventors: Max Lagally, Francesca Cavallo, Vijay Saradhi Mangu
The Invention
Methods for fabricating thin, high-aspect-ratio Ge nanostructures from high-quality, single-crystalline Ge substrates are provided. Also provided are grating structures made using the methods. The methods utilize a thin layer of graphene between a surface of a Ge substrate, and an overlying resist layer. The graphene passivates the surface, preventing the formation of water-soluble native Ge oxides that can result in the lift-off of the resist during the development of the resist.
Additional Information
For More Information About the Inventors
For current licensing status, please contact Jeanine Burmania at [javascript protected email address] or 608-960-9846