Semiconductors & Integrated Circuits
SELECTED-AREA DEPOSITION OF HIGHLY ALIGNED CARBON NANOTUBE FILMS USING CHEMICALLY AND TOPOGRAPICALLY PATTERNED SUBSTRATES
WARF: P210225US02
Inventors: Padma Gopalan, Jonathan Dwyer, Katherine Jinkins, Michael Arnold
The Invention
UW Madison researchers have developed methods for forming films of aligned carbon nanotubes. The methods also provide for making electronic devices that incorporate the films as active layers. The films are formed by flowing a suspension of carbon nanotubes over a substrate surface that is chemically and topographically patterned. The methods provide a rapid and scalable means of forming films of densely packed and aligned carbon nanotubes over large surface areas.
Additional Information
For More Information About the Inventors
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